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Author Matsuda, Yoshinobu: 31    link image

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2009-01-27 Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films Iwata, Tadashi; Kan, Ryouji; Shibasaki, Takashi; Shinohara, Masanori; Matsuda, Yoshinobu 795
2018-10-08 Anomalous plasma temperature at supercritical phase of pressurized CO2 after pulsed breakdown followed by large short-circuit current Furusato, Tomohiro; Ashizuka, Naokazu; Kamagahara, Takeshi; Matsuda, Yoshinobu; Yamashita, Takahiko; Sasaki, Mitsuru; Kiyan, Tsuyoshi; Inada, Yuki 224
2013-09-23 Deposition of Aluminum-Doped ZnO Films by ICP-Assisted Sputtering Matsuda, Yoshinobu; Hirashima, Akinori; Mine, Kenji; Hashimoto, Takuhiro; Matsuoka, Daichi; Shinohara, Masanori; Okada, Tatsuo 530
2010-11 Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering Shindo, Ryota; Iwata, Tadashi; Hirashima, Akinori; Shinohara, Masanori; Matsuda, Yoshinobu 1044
2010-01-21 Effects of Hydrogen Plasma Exposure on Amorphous Carbon Film Surface, Investigated with Infrared Spectroscopy Kawazoe, Hiroki; Kawakami, Taka-aki; Hara, Kojiro; Shinohara, Masanori; Matsuda, Yoshinobu; Fujiyama, Hiroshi 746
2008-01-29 Generation of Solution Plasma for Surface Treatment Akaki, Kazuhiko; Matsuda, Masanorix; Matsuda, Yoshinobu; Fujiyama, Hiroshi 1062
2009-01-27 Influence of hydrogen addition on electric and optical properties of sputter-deposited aluminum-doped zinc oxide thin films Kan, Ryoji; Iwata, Tadashi; Shibasaki, Takashi; Shinohara, Masanori; Matsuda, Yoshinobu 947
2008-01-29 Investigation of Deposition Process of Amorphous Carbon Film Inayioshi, Takanori; Shinohara, Masanori; Kawazoe, Taiki; Matsuda, Yoshinobu; Fujiyama, Hiroshi; Nakatani, Tatsuyuki 987
2010-01-21 Measurement of Metal Atom Densities during Sputter-deposition of Al-doped ZnO Thin Films Shindo, Ryota; Iwata, Tadashi; Komine, Kazuki; Shinohara, Masanori; Matsuda, Yoshinobu 734
1996-05 Mechanism of particle transport in magnetized silane plasmas Yang, S-C; Nakajima, Y; Maemura, Yoko; Matsuda, Yoshinobu; Fujiyama, Hiroshi 650
2003-07 MgO薄膜高速成膜のための誘導結合プラズマ支援反応性スパッタリング法の開発 小山, 悠; 岩谷, 勝; 篠原, 正典; 松田, 良信; 藤山, 寛 2912
2009-01-27 Monitoring of Chemical Vapor Deposition Process of Hydrocarbon Thin Films by Optical Reflectance Interferometry Uehara, Kazuishi; Shinohara, Masanori; Matsuda, Yoshinobu 900
2009-01-27 Observation of Arcing in DC Magnetron Sputtering of AZO Target Komine, Kazuki; Shinohara, Masanori; Matsuda, Yoshinobu 1304
2010-01-21 Oxidation Process of Amorphous Carbon Film Due to Oxygen Plasma, Investigated with Infrared Spectroscopy Kawazoe, Hiroki; Kawakami, Taka-aki; Hara, Kojiro; Shinohara, Masanori; Matsuda, Yoshinobu; Fujiyama, Hiroshi 755
2010-01-21 Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition inside a Narrow Tube Zhang, Shuai; Kotani, Kenji; Akaki, Kazuhiko; Shinohara, Masanori; Matsuda, Yoshinobu; Fujiyama, Hiroshi 754
2019-05-06 Simulation of voltage/current waveforms and contact area of pulsed surface discharge on water Furusato, Tomohiro; Yamamoto, Yota; Sakamoto, Takuya; Oura, Kazushi; Matsuda, Yoshinobu; Yamashita, Takahiko 253
2009-01-27 Source Molecular Effect on Amorphous Carbon Film Deposition Kawazoe, Hiroki; Inayoshi, Takanori; Shinohara, Masanori; Matsuda, Yoshinobu; Fujiyama, Hiroshi; Nitta, Yuki; Nakatani, Tatsuyuki 806
2009-01-27 Substrate Bias Effect on Deposition Process of Amorphous Carbon Films Inayoshi, Takanori; Kawazoe, Hiroki; Shinohara, Masanori; Matsuda, Yoshinobu; Fujiyama, Hiroshi; Nitta, Yuki; Nakatani, Tatsuyuki 874
2010-11 Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition Kitagawa, Hiroaki; Kan, Ryoji; Mine, Kenji; Shinohara, Masanori; Matsuda, Yoshinobu 696
2010-01-21 Thermal Probe Measurements of Energy Flux onto a Substrate in Inductively Coupled Plasmas Kitagawa, Hiroaki; Kan, Ryoji; Shinohara, Masanori; Matsuda, Yoshinobu 827
2020-03-05 Validation of the local thermodynamic equilibrium at a local current concentration area of positive pulsed surface discharge plasma on water Furusato, Tomohiro; Oura, Kazushi; Matsuda, Yoshinobu; Sasaki, Mitsuru; Inada, Yuki; Yamashita, Takahiko 2
1992-07 ネオン原子の高リュードベリ状態のシュタルク構造 天崎, 文晶; 松田, 良信; 藤山, 寛 1342
2003-07 ハーモニック電子サイクロトロン共鳴マイクロプラズマ源の開発 松下, 正典; 松田, 良信; 藤山, 寛 1022
1991-01 プラズマ計測のための高出力LC反転形窒素レーザーの製作 松田, 良信; 藤山, 寛 2201
1992-01 プラズマ診断用狭帯域二波長パルス色素レーザー 松田, 良信; 藤山, 寛; 天崎, 文晶 880
2005-03 マイクロホローカソード光源を用いた真空紫外吸収分光法の開発 井手, 義行; 篠原, 正典; 松田, 良信; 藤山, 寛 1903
1994-01 レーザー誘起蛍光法による反応性スパッタリング中の中性インジウム原子密度計測 城戸, 拓也; 阿野, 一巳; 白方, 一浩; 松田, 良信 1161
2003-07 基板表面磁界がスパッタ薄膜結晶配向性に及ぼす影響 丸本, 洋; 松田, 良信; 篠原, 正典; 藤山, 寛 3023
2005-03 細管内壁コーティングのためのヘリコン波プラズマ源の開発 小島, 裕爾; 篠原, 正典; 松田, 良信; 藤山, 寛 1167
2005-03 多重外部反射赤外分光法の開発 倉本, 宰弘; 篠原, 正典; 松田, 良信; 藤山, 寛 1681
1992-07 二段階レーザー励起オプトガルバノ法によるネオンホローカソード放電中の電界計測 松田, 良信; 藤山, 寛; 天崎, 文晶 1557

 

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