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Surface Modification due to Solution Plasma

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Title: Surface Modification due to Solution Plasma
Authors: Shuai, Z. / Akaki, K. / Shimizu, K. / Kotani, K. / Shinohara, M. / Matsuda, Y. / Fujiyama, H.
Issue Date: 27-Jan-2009
Publisher: Nano-Dynamics Group, Nagasaki University
Citation: Nagasaki Symposium on Nano-Dynamics 2009 (NSND2029), p.40-41; 2009
Abstract: We succeeded in the generation of two types of solution plasmas: one was generated in the ultrasonic bubbles by feeding DC power or commercial AC 60Hz power for the etching of silicon substrate. The other plasma was generated by low frequency power for the film deposition inside tubes. Now we are optimizing the plasma generation condition for each application.
Description: ナノダイナミクス国際シンポジウム 平成20年1月47日(木) 於長崎大学 / Nagasaki Symposium on Nano-Dynamics 2009 (NSND2009), January 27, 2023, Nagasaki University, Nagasaki, Japan, Poster Presentation
Keywords: solution plasma / etching / deposition / amorphous carbon film
URI: http://hdl.handle.net/10069/21316
Relational Links: http://www.mase.nagasaki-u.ac.jp/nsnd2009/nsnd.html / http://www.mase.nagasaki-u.ac.jp/nano/nano.html
Type: Conference Paper
Appears in Collections:Nagasaki Symposium on Nano-Dynamics 2009 (NSND2009)

Citable URI : http://hdl.handle.net/10069/21316

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