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IMAによるNi中Cu,Alの拡散係数の研究


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Title: IMAによるNi中Cu,Alの拡散係数の研究
Other Titles: IMA Analysis of Diffusion Coefficients of Cu and Al in Ni
Authors: 羽坂, 雅之 / 古瀬, 辰治 / 渡辺, 哲也 / 内山, 休男 / 古賀, 秀人
Authors (alternative): Hasaka, Masayuki / Furuse, Tatsuji / Watanabe, Tetsuya / Uchiyama, Yasuo / Koga, Hideto
Issue Date: Jan-1990
Publisher: 長崎大学工学部 / Faculty of Engineering, Nagasaki University
Citation: 長崎大学工学部研究報告, 20(34), pp.59-64; 1990
Abstract: With a secondary-ion micro-analyser (IMA), diffusion coefficients of Cu and Al in polycrystalline Ni were investigated for temperatures ranging from 1269K to 723K, namely from 0.72 Tm to 0.42 Tm, where Tm is a melting point of Ni. The activation energies and the frequency factors of lattice diffusion observed at high temperature were: - Qi = 256kj/mol, D0 = 0.52cm2/s above 919K for Cu, - Qi = 244kj/mol, D0 = 0.24cm2/s above 938K for Al. These activation energies agreed well with the values which were theoretically estimated from energies of vacancy formation and atom migration. The activation energies and the frequency factors of the short circuit diffusion observed at low temperature were: - Qi = 67kj/mol, D0 = 1.4 × 10-11cm2/s below 872K for Cu, - Qi = 90kj/mol, D0 = 1.2×10-9cm2/s below 919K for Al.
URI: http://hdl.handle.net/10069/24314
ISSN: 02860902
Type: Departmental Bulletin Paper
Text Version: publisher
Appears in Collections:Volume 20, No. 34

Citable URI : http://hdl.handle.net/10069/24314

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