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Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering

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タイトル: Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering
著者: Shindo, Ryota / Iwata, Tadashi / Hirashima, Akinori / Shinohara, Masanori / Matsuda, Yoshinobu
発行日: 2010年11月
出版者: IEEE
引用: TENCON 2010, pp.1002-1006; 2010
抄録: Aluminum-doped zinc oxide (AZO) is one of the promising transparent conductive oxide materials, which is expected to be an alternative to tin-doped indium oxide (ITO) that for long has been widely used in industry. The authors have been engaged in the development of AZO deposition process using inductively-coupled plasma assisted sputtering in a couple of years. This paper reports the results showing effectiveness of inductively coupled plasma (ICP) assisted sputtering in AZO film deposition process.
記述: 2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24
キーワード: Inductively-coupled plasma / Optical spectroscopy / Sputtering / Transparent conducting oxide films / Zinc oxide
URI: http://hdl.handle.net/10069/25079
ISBN: 978-1-4244-6889-8
DOI: 10.1109/TENCON.2010.5686462
権利: © 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
資料タイプ: Conference Paper
原稿種類: author
出現コレクション:060 会議発表資料

引用URI : http://hdl.handle.net/10069/25079



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