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Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition

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Title: Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition
Authors: Kitagawa, Hiroaki / Kan, Ryoji / Mine, Kenji / Shinohara, Masanori / Matsuda, Yoshinobu
Issue Date: Nov-2010
Publisher: IEEE
Citation: TENCON 2010, pp.2208-2212; 2010
Abstract: Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering is quantitatively clarified.
Description: 2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24
Keywords: Energy flux / Inductively coupled plasma / Thermal probe / Transparent conductive film
URI: http://hdl.handle.net/10069/25080
ISBN: 978-1-4244-6889-8
DOI: 10.1109/TENCON.2010.5686695
Rights: © 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Type: Conference Paper
Text Version: author
Appears in Collections:Conference Paper

Citable URI : http://hdl.handle.net/10069/25080

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