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Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition

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タイトル: Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition
著者: Kitagawa, Hiroaki / Kan, Ryoji / Mine, Kenji / Shinohara, Masanori / Matsuda, Yoshinobu
発行日: 2010年11月
出版者: IEEE
引用: TENCON 2010, pp.2208-2212; 2010
抄録: Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering is quantitatively clarified.
記述: 2010 IEEE Region 10 Conference (TENCON 2010) : Fukuoka, 2010.11.21-2010.11.24
キーワード: Energy flux / Inductively coupled plasma / Thermal probe / Transparent conductive film
URI: http://hdl.handle.net/10069/25080
ISBN: 978-1-4244-6889-8
DOI: 10.1109/TENCON.2010.5686695
権利: © 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
資料タイプ: Conference Paper
原稿種類: author
出現コレクション:060 会議発表資料

引用URI : http://hdl.handle.net/10069/25080



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