DSpace university logo mark
Japanese | English 

NAOSITE : Nagasaki University's Academic Output SITE > 060 工学部・工学研究科 > 060 学術雑誌論文 >

STEM image simulation by Bloch-wave method with layer-by-layer representation.

ファイル 記述 サイズフォーマット
JEM59_S23.pdf1.03 MBAdobe PDF本文ファイル

タイトル: STEM image simulation by Bloch-wave method with layer-by-layer representation.
著者: Morimura, Takao
発行日: 2010年 8月
引用: Journal of Electron Microscopy, 59(1), pp.S23-S28; 2010
抄録: In a Bloch-wave-based STEM image simulation, a framework for calculating the cross section for any incoherent scattering process was formulated by Allen et al. [(2003) Lattice-resolution contrast from a focused coherent electron probe. Part I. Ultramicroscopy 96: 47-63; Part II. ibid. 96: 65-81]. They simulated the high-angle annular dark-field, back-scattered electron, electron energy-loss spectroscopy and energy-dispersive X-ray (EDX) STEM images from the inelastic scattering coefficients. Furthermore, a skilful approach for deriving the excitation amplitude and block diagonalization in the eigenvalue equation was employed to reduce computing time and memory. In the present work, I extended their scheme to a layer-by-layer representation for application to inhomogeneous crystals. Calculations for a multi-layer Si sample including a displaced layer were performed by multiplying Allen et al.'s block-diagonalized matrices. Electron intensities within the sample and EDX STEM images were calculated at various conditions. From the calculations, three-dimensional STEM analysis was considered.
キーワード: Bethe equation / Bloch-wave method / EDX / inelastic electron scattering / layer-by-layer / STEM
URI: http://hdl.handle.net/10069/25636
ISSN: 00220744
DOI: 10.1093/jmicro/dfq028
PubMed ID: 20573745
権利: © The Author 2010. Published by Oxford University Press on behalf of Japanese Society of Microscopy. All rights reserved. For permissions, please e-mail: journals.permissions@oxfordjournals.org / This is a pre-copy-editing, author-produced PDF of an article accepted for publication in Journal of electron microscopy following peer review. The definitive publisher-authenticated version Journal of electron microscopy, 59(1), pp.S23-S28; 2010 is available online at: http://jmicro.oxfordjournals.org/content/59/S1/S23.
資料タイプ: Journal Article
原稿種類: author
出現コレクション:060 学術雑誌論文

引用URI : http://hdl.handle.net/10069/25636



Valid XHTML 1.0! Copyright © 2006-2015 長崎大学附属図書館 - お問い合わせ Powerd by DSpace